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13-15.5GHz GaN MMIC Power Amplifier Chip RFSPA1207C-1216P30
RFSPA1207C-1216P30

13-15.5GHz GaN MMIC Power Amplifier Chip RFSPA1207C-1216P30

RFSPA1207C-1216P30 is a GaN MMIC power amplifier chip covering 13–15.5 GHz with 23 dB power gain, 45 dBm saturated output power and 32% PAE, operating in both pulsed and CW modes.

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Technical information

Product details

Product Overview

The RFSPA1207C-1216P30 is a GaN power amplifier chip covering 13–15.5 GHz, with 23 dB power gain, 45 dBm saturated output power and 32% PAE. It operates in both pulsed and CW modes. Chip size: 5.00 × 6.70 × 0.10 mm. All chips are 100% DC and RF tested on-wafer.

Key Features

  • 13–15.5 GHz bandwidth

  • 23 dB power gain with ±0.75 dB flatness; 32 dB linear gain

  • 45 dBm saturated output power

  • 32% power-added efficiency (PAE)

  • IMD3 −30 dBc @ Pout = 40 dBm (ICQ = 700 mA, two-tone spacing 5 MHz)

  • Operates in both pulsed and CW modes; 100% DC and RF tested on-wafer

RFSPA1207C-1216P30 power gain vs. frequency test data

Technical Specifications

ModelRFSPA1207C-1216P30
Product CategoryMMIC Products
Device TypeGaN MMIC Power Amplifier Chip (bare die)
Frequency Range13–15.5 GHz
Linear Gain32 dB (typ)
Power Gain23 dB (typ) · flatness ±0.75 dB
Input / Output Return Loss−7 dB / −7 dB
Saturated Output Power45 dBm (typ)
PAE32% (typ)
IMD3−30 dBc @ Pout = 40 dBm, ICQ = 700 mA, two-tone spacing 5 MHz
Operating Current3.5 A (typ) · +28 V @ 3.0 A (quiescent)
Chip Size5.00 × 6.70 × 0.10 mm
Thermal Resistance1.0 °C/W
Operating ModesPulsed and CW
Test ConditionsVD = 28 V (CW), VG = −1.6 V, Pin = 22 dBm, TA = +25 °C
Absolute Maximum RatingsVDS +32 V · VGS −5 V · Pin +30 dBm · Tch +200 °C
RF / Bias PadsRF_IN / RF_OUT: 100 × 120 μm² · VG: 100 × 120 μm² · VD1: 100 × 150 μm², VD2: 100 × 140 μm², VD3: 110 × 150 μm² · outline tolerance ±20 μm

Assembly & Handling Notes

  • Store in a dry, clean N2 environment; the 6H-SiC substrate is brittle — handle carefully to avoid damage

  • Carrier CTE should be close to 6H-SiC (4.2×10⁻⁶/°C); CuMoCu, CuMo or CuW recommended; avoid voids between chip and carrier and ensure good heat dissipation

  • Eutectic bonding with AuSn solder (Au:Sn = 80%:20%), temperature ≤300 °C, time ≤30 s; avoid rapid temperature changes

  • Gold wires of 25–30 μm diameter recommended; bonding stage temperature ≤250 °C

  • Power sequencing: apply gate bias before drain bias on power-up; remove drain bias before gate bias on power-down

  • External capacitors C1 = 100 pF, C2 = 1000 pF close to the chip (within 500 μm); DC-blocking capacitors integrated at chip input and output

  • ESD precautions: wear a grounded anti-static wrist strap and ensure the sintering/bonding stages are well grounded