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11-13GHz GaN MMIC Power Amplifier Chip RFSPA1249C-1113P35
RFSPA1249C-1113P35

11-13GHz GaN MMIC Power Amplifier Chip RFSPA1249C-1113P35

RFSPA1249C-1113P35 is a GaN MMIC power amplifier chip covering 11–13 GHz with 22.5 dB power gain, 45.5 dBm saturated output power and 37% PAE, operating in both pulsed and CW modes.

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Technical information

Product details

Product Overview

The RFSPA1249C-1113P35 is a GaN power amplifier chip covering 11–13 GHz, with 22.5 dB power gain, 45.5 dBm saturated output power and 37% PAE. It operates in both pulsed and CW modes. Chip size: 5.77 × 6.70 × 0.10 mm. All chips are 100% DC and RF tested on-wafer.

Key Features

  • 11–13 GHz bandwidth

  • 22.5 dB power gain with ±0.5 dB flatness; 28 dB linear gain

  • 45.5 dBm saturated output power

  • 37% power-added efficiency (PAE)

  • IMD3 −25 dBc @ Pout = 43 dBm (two-tone spacing 5 MHz)

  • Operates in both pulsed and CW modes; 100% DC and RF tested on-wafer

RFSPA1249C-1113P35 power gain vs. frequency test data

Technical Specifications

ModelRFSPA1249C-1113P35
Product CategoryMMIC Products
Device TypeGaN MMIC Power Amplifier Chip (bare die)
Frequency Range11–13 GHz
Linear Gain28 dB (typ) · flatness ±1 dB
Power Gain22.5 dB (typ) · flatness ±0.5 dB
Input / Output Return Loss−7 dB / −9 dB
Saturated Output Power45.5 dBm (typ)
PAE37% (typ)
IMD3−25 dBc @ Pout = 43 dBm, two-tone spacing 5 MHz
Operating Current3.7 A (typ) · +28 V @ 0.8 A (quiescent)
Chip Size5.77 × 6.70 × 0.10 mm
Thermal Resistance1.3 °C/W
Operating ModesPulsed and CW
Test ConditionsVD = 28 V (CW), VG = −2.8 V, Pin = 23 dBm, TA = +25 °C
Absolute Maximum RatingsVDS +32 V · VGS −5 V · Pin +30 dBm · Tch +200 °C
RF / Bias PadsRF_IN / RF_OUT: 100 × 120 μm² · VG: 120 × 100 μm² · VD1: 150 × 100 μm², VD2: 140 × 100 μm², VD3: 150 × 110 μm² · outline tolerance ±20 μm

Assembly & Handling Notes

  • Store in a dry, clean N2 environment; the 6H-SiC substrate is brittle — handle carefully to avoid damage

  • Carrier CTE should be close to 6H-SiC (4.2×10⁻⁶/°C); CuMoCu, CuMo or CuW recommended; avoid voids between chip and carrier and ensure good heat dissipation

  • Eutectic bonding with AuSn solder (Au:Sn = 80%:20%), temperature ≤300 °C, time ≤30 s; avoid rapid temperature changes

  • Gold wires of 25–30 μm diameter recommended; bonding stage temperature ≤250 °C

  • Power sequencing: apply gate bias before drain bias on power-up; remove drain bias before gate bias on power-down

  • External capacitors C1 = 100 pF, C2 = 1000 pF close to the chip (within 500 μm); DC-blocking capacitors integrated at chip input and output

  • ESD precautions: wear a grounded anti-static wrist strap and ensure the sintering/bonding stages are well grounded